| High-resolution EM of colloidal nanocrystal growth using graphene liquid cells JM Yuk, J Park, P Ercius, K Kim, DJ Hellebusch, MF Crommie, JY Lee, ... Science 336 (6077), 61-64, 2012 | 1151 | 2012 |
| Spray-deposited CuInSe2 nanocrystal photovoltaics VA Akhavan, BW Goodfellow, MG Panthani, DK Reid, DJ Hellebusch, ... Energy & Environmental Science 3 (10), 1600-1606, 2010 | 167 | 2010 |
| In Vivo Whole Animal Fluorescence Imaging of a Microparticle-Based Oral Vaccine Containing (CuInSexS2–x)/ZnS Core/Shell Quantum Dots MG Panthani, TA Khan, DK Reid, DJ Hellebusch, MR Rasch, JA Maynard, ... Nano letters 13 (9), 4294-4298, 2013 | 122 | 2013 |
| Ultrasensitive photodetectors exploiting electrostatic trapping and percolation transport Y Zhang, DJ Hellebusch, ND Bronstein, C Ko, DF Ogletree, M Salmeron, ... Nature communications 7 (1), 11924, 2016 | 77 | 2016 |
| In situ transmission electron microscopy of cadmium selenide nanorod sublimation DJ Hellebusch, K Manthiram, BJ Beberwyck, AP Alivisatos The Journal of Physical Chemistry Letters 6 (4), 605-611, 2015 | 26 | 2015 |
| Role of surfactants in adhesion reduction for step and flash imprint lithography MW Lin, DJ Hellebusch, K Wu, EK Kim, KH Lu, KM Liechti, JG Ekerdt, ... Journal of Micro/Nanolithography, MEMS and MOEMS 7 (3), 033005-033005-8, 2008 | 24 | 2008 |
| Reactive fluorinated surfactant for step and flash imprint lithography T Ogawa, DJ Hellebusch, MW Lin, BM Jacobsson, W Bell, CG Willson Alternative Lithographic Technologies III 7970, 158-164, 2011 | 12 | 2011 |
| Interfacial adhesion studies for step and flash imprint lithography MW Lin, DJ Hellebusch, K Wu, EK Kim, K Lu, L Tao, KM Liechti, JG Ekerdt, ... Emerging Lithographic Technologies XII 6921, 111-122, 2008 | 8 | 2008 |
| Reactive fluorinated surfactant for step and flash imprint lithography T Ogawa, DJ Hellebusch, MW Lin, BM Jacobsson, W Bell, CG Willson Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (3), 031114-031114, 2013 | 4 | 2013 |
| Energy Environ VA Akhavan, BW Goodfellow, MG Panthani, DK Reid, DJ Hellebusch, ... Sci 3, 1600-1606, 2010 | 3 | 2010 |
| Photodetectors exploiting electrostatic trapping and percolation transport AP Alivisatos, M Salmeron, Y Zhang, DJ Hellebusch US Patent 10,177,271, 2019 | 1 | 2019 |
| Sintered CdTe nanocrystal films for optoelectronic applications and the sublimation of CdSe nanorods DJ Hellebusch University of California, Berkeley, 2015 | 1 | 2015 |
| High-Resolution Transmission Electron Microscopy Observation of Colloidal Nanocrystal Growth Mechanisms using Graphene Liquid Cells JM Yuk | 1 | 2012 |
| Self-aligned patterning on a flexible substrate using a dual-tone, thermally activated photoresist WLK Jen, BM Rawlings, JR Strahan, DJ Hellebusch, WJ Durand, ... Journal of Vacuum Science & Technology B 30 (1), 2012 | 1 | 2012 |
| Fluorinated silazane release agents in nanoimprint lithography CG Willson, T Ogawa, MW Lin, DJ Hellebusch, BM Jacobsson, WK Bell US Patent 8,926,888, 2015 | | 2015 |
| High-resolution TEM of CdSe nanorod sublimation DJ Hellebusch, AP Alivisatos ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 247, 2014 | | 2014 |
| Halide surface modification of cadmium telluride nanocrystals DJ Hellebusch, AP Alivisatos ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 245, 2013 | | 2013 |
| Interfacial adhesion studies for step and flash imprint lithography [6921-13] MW Lin, DJ Hellebusch, K Wu, EK Kim, K Lu, L Tao, KM Liechti, JG Ekerdt, ... PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING 6921 (1 …, 2008 | | 2008 |
