Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
1362 2006 High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
763 2012 On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
464 2010 Physics and technology of magnetron sputtering discharges JT Gudmundsson
Plasma Sources Science and Technology 29 (11), 113001, 2020
397 2020 The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
390 2006 Oxygen discharges diluted with argon: dissociation processes JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
329 2007 Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005
304 2005 Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
276 2002 Electronegativity of low-pressure high-density oxygen discharges JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
252 2001 The low pressure Cl EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
247 * 2010 On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
203 2001 Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
186 2001 Variable sensitivity of plant communities in Iceland to experimental warming IS Jónsdóttir, B Magnusson, J Gudmundsson, A Elmarsdottir, H Hjartarson
Global Change Biology 11 (4), 553-563, 2005
178 2005 Organic carbon in Icelandic Andosols: geographical variation and impact of erosion H Óskarsson, Ó Arnalds, J Gudmundsson, G Gudbergsson
Catena 56 (1-3), 225-238, 2004
168 2004 Improved volume-averaged model for steady and pulsed-power electronegative discharges S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A 24 (6), 2025-2040, 2006
156 2006 Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
152 2005 Experimental studies of O2/Ar plasma in a planar inductive discharge JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
143 1999 The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
140 2010 Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
137 2005 On the plasma parameters of a planar inductive oxygen discharge JT Gudmundsson, AM Marakhtanov, KK Patel, VP Gopinath, ...
Journal of Physics D: Applied Physics 33 (11), 1323, 2000
126 2000 