Evangelos Gogolides
Evangelos Gogolides
Director of Research, Institute of Nanoscience and Nanotechnology, NCSR "Demokritos"
Η διεύθυνση ηλεκτρονικού ταχυδρομείου έχει επαληθευτεί στον τομέα inn.demokritos.gr - Αρχική σελίδα
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Mechanisms of oxygen plasma nanotexturing of organic polymer surfaces: from stable super hydrophilic to super hydrophobic surfaces
K Tsougeni, N Vourdas, A Tserepi, E Gogolides, C Cardinaud
Langmuir 25 (19), 11748-11759, 2009
2982009
Continuum modeling of radio‐frequency glow discharges. I. Theory and results for electropositive and electronegative gases
E Gogolides, HH Sawin
Journal of applied physics 72 (9), 3971-3987, 1992
2221992
Nanotexturing of poly (dimethylsiloxane) in plasmas for creating robust super-hydrophobic surfaces
AD Tserepi, ME Vlachopoulou, E Gogolides
Nanotechnology 17 (15), 3977, 2006
2062006
From superamphiphobic to amphiphilic polymeric surfaces with ordered hierarchical roughness fabricated with colloidal lithography and plasma nanotexturing
K Ellinas, A Tserepi, E Gogolides
Langmuir 27 (7), 3960-3969, 2011
1752011
“Smart” polymeric microfluidics fabricated by plasma processing: controlled wetting, capillary filling and hydrophobic valving
K Tsougeni, D Papageorgiou, A Tserepi, E Gogolides
Lab on a Chip 10 (4), 462-469, 2010
1732010
Nanotextured super-hydrophobic transparent poly (methyl methacrylate) surfaces using high-density plasma processing
N Vourdas, A Tserepi, E Gogolides
Nanotechnology 18 (12), 125304, 2007
1682007
Hierarchical micro and nano structured, hydrophilic, superhydrophobic and superoleophobic surfaces incorporated in microfluidics, microarrays and lab on chip microsystems
E Gogolides, K Ellinas, A Tserepi
Microelectronic Engineering 132, 135-155, 2015
1432015
Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors
V Constantoudis, GP Patsis, A Tserepi, E Gogolides
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
1352003
Plasma micro-nanotextured, scratch, water and hexadecane resistant, superhydrophobic, and superamphiphobic polymeric surfaces with perfluorinated monolayers
K Ellinas, SP Pujari, DA Dragatogiannis, CA Charitidis, A Tserepi, ...
ACS applied materials & interfaces 6 (9), 6510-6524, 2014
1312014
Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
V Constantoudis, GP Patsis, LHA Leunissen, E Gogolides
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
1132004
Control of Nanotexture and Wetting Properties of Polydimethylsiloxane from Very Hydrophobic to Super‐Hydrophobic by Plasma Processing
K Tsougeni, A Tserepi, G Boulousis, V Constantoudis, E Gogolides
Plasma Processes and Polymers 4 (4), 398-405, 2007
1042007
Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
E Gogolides, V Constantoudis, G Kokkoris, D Kontziampasis, K Tsougeni, ...
Journal of Physics D: Applied Physics 44 (17), 174021, 2011
1002011
A review of line edge roughness and surface nanotexture resulting from patterning processes
E Gogolides, V Constantoudis, GP Patsis, A Tserepi
Microelectronic Engineering 83 (4-9), 1067-1072, 2006
1002006
Comparison of experimental measurements and model predictions for radio‐frequency Ar and SF6 discharges
E Gogolides, JP Nicolai, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 7 (3 …, 1989
971989
A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics
G Kokkoris, A Goodyear, M Cooke, E Gogolides
Journal of Physics D: Applied Physics 41 (19), 195211, 2008
912008
Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
GP Patsis, V Constantoudis, A Tserepi, E Gogolides, G Grozev
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
912003
Etching of and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition
E Gogolides, P Vauvert, G Kokkoris, G Turban, AG Boudouvis
Journal of Applied Physics 88 (10), 5570-5584, 2000
912000
RF plasmas in methane: Prediction of plasma properties and neutral radical densities with combined gas-phase physics and chemistry model
E Gogolides, D Mary, A Rhallabi, G Turban
Japanese journal of applied physics 34 (1R), 261, 1995
901995
Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon
NV Mantzaris, E Gogolides, AG Boudouvis, A Rhallabi, G Turban
Journal of applied physics 79 (7), 3718-3729, 1996
881996
Durable superhydrophobic and superamphiphobic polymeric surfaces and their applications: A review
K Ellinas, A Tserepi, E Gogolides
Advances in colloid and interface science 250, 132-157, 2017
792017
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