| Optical materials: Microstructuring surfaces with off-electrode plasma NL Kazanskiy, VA Kolpakov CRC Press, 2017 | 67 | 2017 |
| Adhesion and friction performance of DLC/rubber: The influence of plasma pretreatment C Bai, Z Gong, L An, L Qiang, J Zhang, G Yushkov, A Nikolaev, ... Friction 9, 627-641, 2021 | 24 | 2021 |
| Boron ion beam generation using a self-sputtering planar magnetron A Vizir, A Nikolaev, E Oks, K Savkin, M Shandrikov, G Yushkov Review of Scientific Instruments 85 (2), 2014 | 21 | 2014 |
| Operating modes of a hydrogen ion source based on a hollow-cathode pulsed Penning discharge EM Oks, MV Shandrikov, AV Vizir Review of scientific instruments 87 (2), 2016 | 15 | 2016 |
| Ion mass-to-charge ratio in planar magnetron plasma with electron injections MV Shandrikov, AS Bugaev, EM Oks, AV Vizir, GY Yushkov Journal of Physics D: Applied Physics 51 (41), 415201, 2018 | 12 | 2018 |
| Generation of micron and submicron particles in atmospheric pressure discharge in argon flow with magnesium, zinc, and boron carbide electrodes KP Savkin, AS Bugaev, VI Gushenets, AG Nikolaev, YF Ivanov, EM Oks, ... Surface and Coatings Technology 389, 125578, 2020 | 10 | 2020 |
| Sheet resistance of alumina ceramic after high energy implantation of tantalum ions KP Savkin, AS Bugaev, AG Nikolaev, EM Oks, MV Shandrikov, ... Applied surface science 310, 321-324, 2014 | 10 | 2014 |
| Gridless, very low energy, high-current, gaseous ion source AV Vizir, MV Shandrikov, GY Yushkov, EM Oks Review of Scientific Instruments 81 (2), 2010 | 10 | 2010 |
| Planar magnetron discharge with confinement of injected electrons MV Shandrikov, ID Artamonov, IY Bakeev, AS Bugaev, EM Oks, AV Vizir, ... Vacuum 192, 110487, 2021 | 9 | 2021 |
| Deposition of Cu-films by a planar magnetron sputtering system at ultra-low operating pressure MV Shandrikov, ID Artamonov, AS Bugaev, EM Oks, KV Oskomov, ... Surface and Coatings Technology 389, 125600, 2020 | 9 | 2020 |
| A bulk plasma generator based on a plasma cathode discharge AV Vizir, EM Oks*, MV Shandrikov, GY Yushkov Instruments and Experimental Techniques 46, 384-387, 2003 | 9 | 2003 |
| Parameters and properties of a pulsed planar vacuum magnetron discharge AV Vizir, EM Oks, MV Shandrikov, GY Yushkov Vacuum 178, 109400, 2020 | 8 | 2020 |
| Generation of space charge compensated low energy ion flux AV Vizir, MV Shandrikov, EM Oks Review of Scientific Instruments 79 (2), 2008 | 8 | 2008 |
| Planar magnetron sputtering with supplementary electron injection MV Shandrikov, AS Bugaev, EM Oks, AV Vizir, GY Yushkov Vacuum 143, 458-463, 2017 | 7 | 2017 |
| Low-energy dc ion source for low operating pressure E Oks, M Shandrikov, C Salvadori, I Brown Review of Scientific Instruments 85 (8), 2014 | 7 | 2014 |
| Inverted end-Hall-type low-energy high-current gaseous ion source EM Oks, AV Vizir, MV Shandrikov, GY Yushkov, DM Grishin, A Anders, ... Review of Scientific Instruments 79 (2), 2008 | 7 | 2008 |
| Effect of electron injection on the parameters of a pulsed planar magnetron MV Shandrikov, AS Bugaev, EM Oks, AG Ostanin, AV Vizir, GY Yushkov Vacuum 159, 200-203, 2019 | 6 | 2019 |
| The influence of discharge parameters on the generation of ions H3 + in the source based on reflective discharge with hollow cathode AV Vizir’, EM Oks, MV Shandrikov, GY Yushkov Technical Physics 62, 380-383, 2017 | 6 | 2017 |
| Improved plasma uniformity in a discharge system with electron injection AV Vizir, AV Tyunkov, MV Shandrikov Review of Scientific Instruments 80 (2), 2009 | 6 | 2009 |
| Generation of boron ions for beam and plasma technologies AS Bugaev, AV Vizir, VI Gushenets, AG Nikolaev, EM Oks, KP Savkin, ... Russian Physics Journal 62, 1117-1122, 2019 | 5 | 2019 |
Efim OksTomsk state university of control systems and radioelectronics (TUSUR)Η διεύθυνση ηλεκτρονικού ταχυδρομείου έχει επαληθευτεί στον τομέα fet.tusur.ru
