| Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides M Aiempanakit, A Aijaz, D Lundin, U Helmersson, T Kubart Journal of Applied Physics 113 (13), 2013 | 108 | 2013 |
| Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides M Aiempanakit, T Kubart, P Larsson, K Sarakinos, J Jensen, ... Thin Solid Films 519 (22), 7779-7784, 2011 | 104 | 2011 |
| Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide M Aiempanakit, U Helmersson, A Aijaz, P Larsson, R Magnusson, ... Surface and Coatings Technology 205 (20), 4828-4831, 2011 | 96 | 2011 |
| Studies of hysteresis effect in reactive HiPIMS deposition of oxides T Kubart, M Aiempanakit, J Andersson, T Nyberg, S Berg, U Helmersson Surface and Coatings Technology 205, S303-S306, 2011 | 76 | 2011 |
| Curcumin modified titanium dioxide nanotubes with enhanced visible light photocatalytic performance M Aiempanakit, T Tabtimsri, N Triamnak, C Suwanchawalit International Journal of Electrochemical Science 14 (2), 1954-1967, 2019 | 13 | 2019 |
| Design and fabrication of zinc oxide-graphene nanocomposite for gas sensing applications W Photaram, M Liangruksa, M Aiempanakit, C Suwanchawalit, ... Applied Surface Science 595, 153510, 2022 | 10 | 2022 |
| Effects of oblique angle deposition on optical and morphological properties of WO3 nanorod films for electrochromic application C Salawan, M Aiempanakit, K Aiempanakit, C Chananonnawathorn, ... Materials Today: Proceedings 4 (5), 6423-6429, 2017 | 9 | 2017 |
| Patterning of nanoparticle arrays by self-assembly lithography M Aiempanakit, N Jearnkulprasert, P Panyajirawut Materials Today: Proceedings 4 (5), 6009-6014, 2017 | 7 | 2017 |
| The influence of post annealing on the structure and optical properties of vanadium oxide thin films M Aiempanakit, J Kosum, T Kaewphong Materials Today: Proceedings 4 (5), 6015-6021, 2017 | 7 | 2017 |
| Fabrication of titanium dioxide nanotubes and their photovoltaic performance for dye-sensitized solar cells M Aiempanakit, V Lumpol, T Mangsup, N Triamnak, J Sritharathikun, ... International Journal of Electrochemical Science 15 (10), 10392-10405, 2020 | 6 | 2020 |
| Brazilein modified zinc oxide nanorods with enhanced visible light-responsive photocatalytic efficiency M AIEMPANAKIT, P SUDJAI, K SINGSUMPHAN, S LAKSEE, ... Journal of Metals, Materials and Minerals 32 (2), 70-76, 2022 | 5 | 2022 |
| Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering P Panyajirawut, N Pratumsuwan, K Meesombad, K Thanawattana, ... Materials Today: Proceedings 4 (5), 6311-6316, 2017 | 5 | 2017 |
| Enhancement of Visible Light-Responsive Photocatalytic Efficiency by Using a Laccaic Acid-Modified Titanium Dioxide Photocatalyst M Aiempanakit, J Sangkaworn, N Worawannotai, K Laohhasurayotin, ... Journal of the Brazilian Chemical Society 33, 541-549, 2022 | 3 | 2022 |
| Characterization and electrochromic properties of multi-morphology NiO films prepared by CBD and DC Techniques C Aiempanakit, M Aiempanakit, W Thongjoon, S Pudwat, K Aiempanakit Optik 287, 171131, 2023 | 2 | 2023 |
| Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation C Aiempanakit, A Chanchai, N Kanchai, M Aiempanakit, K Aiempanakit Journal of Metals, Materials and Minerals 31 (2), 123-128, 2021 | 2 | 2021 |
| Reactive High Power Impulse Magnetron Sputtering of Metal Oxides M Aiempanakit Linköping University Electronic Press, 2013 | 2 | 2013 |
| Effect of Oxygen Flow Rate and Post Annealing on Vanadium Oxide Thin Films Prepared by DC Pulse Magnetron Sputtering W Hincheeranun, M Aiempanakit, K Aiempanakit, M Horprathum, ... Key Engineering Materials 675, 233-236, 2016 | 1 | 2016 |
| Effects of continuous and discontinuous deposition time in reactive direct current magnetron sputtering of titanium dioxide thin films M Aiempanakit, C Salawan, K Aiempanakit Advanced Materials Research 1131, 251-254, 2016 | 1 | 2016 |
| Influence of Sputtering Power and Nitrogen Gas Flow Rate on Properties of Titanium Aluminum Nitride Thin Film Deposited by Reactive DC Magnetron Sputtering P Reakaukot, W Wongpisan, K Waree, M Aiempanakit, K Aiempanakit Burapha Science Journal, 654-666, 2022 | | 2022 |
| Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition … J RUKKUN, K AIEMPANAKIT, P REAKAUKOT, W WONGPISAN, ... Journal of Metals, Materials and Minerals 31 (2), 118-122, 2021 | | 2021 |
Ulf HelmerssonProfessor, Linköping UniversityVerified email at liu.se
