Andreas G. Boudouvis
Andreas G. Boudouvis
Η διεύθυνση ηλεκτρονικού ταχυδρομείου έχει επαληθευτεί στον τομέα chemeng.ntua.gr - Αρχική σελίδα
ΤίτλοςΠαρατίθεται απόΈτος
A simple correlation for the operating temperature of photovoltaic modules of arbitrary mounting
E Skoplaki, AG Boudouvis, JA Palyvos
Solar energy materials and solar cells 92 (11), 1393-1402, 2008
3742008
Effect of liquid films on the drying of porous media
AG Yiotis, AG Boudouvis, AK Stubos, IN Tsimpanogiannis, YC Yortsos
AIChE Journal 50 (11), 2721-2737, 2004
1832004
A 2-D pore-network model of the drying of single-component liquids in porous media
AG Yiotis, AK Stubos, AG Boudouvis, YC Yortsos
Advances in Water Resources 24 (3-4), 439-460, 2001
1682001
On the connection between dielectric breakdown strength, trapping of charge, and contact angle saturation in electrowetting
AI Drygiannakis, AG Papathanasiou, AG Boudouvis
Langmuir 25 (1), 147-152, 2009
1002009
Manifestation of the connection between dielectric breakdown strength and contact angle saturation in electrowetting
AG Papathanasiou, AG Boudouvis
Applied Physics Letters 86 (16), 164102, 2005
982005
Radiative heat transfer in natural gas-fired furnaces
EP Keramida, HH Liakos, MA Founti, AG Boudouvis, NC Markatos
International Journal of Heat and Mass Transfer 43 (10), 1801-1809, 2000
972000
Effect of liquid films on the isothermal drying of porous media
AG Yiotis, AG Boudouvis, AK Stubos, IN Tsimpanogiannis, YC Yortsos
Physical Review E 68 (3), 037303, 2003
912003
Etching of and Si in fluorocarbon plasmas: A detailed surface model accounting for etching and deposition
E Gogolides, P Vauvert, G Kokkoris, G Turban, AG Boudouvis
Journal of Applied Physics 88 (10), 5570-5584, 2000
892000
Normal field instability and patterns in pools of ferrofluid
AG Boudouvis, JL Puchalla, LE Scriven, RE Rosensweig
Journal of Magnetism and Magnetic Materials 65 (2-3), 307-310, 1987
881987
Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon
NV Mantzaris, E Gogolides, AG Boudouvis, A Rhallabi, G Turban
Journal of applied physics 79 (7), 3718-3729, 1996
851996
Illuminating the connection between contact angle saturation and dielectric breakdown in electrowetting through leakage current measurements
AG Papathanasiou, AT Papaioannou, AG Boudouvis
Journal of Applied Physics 103, 034901, 2008
832008
Pore-network modeling of isothermal drying in porous media
AG Yiotis, AK Stubos, AG Boudouvis, IN Tsimpanogiannis, YC Yortsos
Transport in porous media 58 (1), 63-86, 2005
772005
Radio‐frequency plasmas in CF4: Self‐consistent modeling of the plasma physics and chemistry
NV Mantzaris, A Boudouvis, E Gogolides
Journal of applied physics 77 (12), 6169-6180, 1995
711995
Simulation of and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface …
G Kokkoris, A Tserepi, AG Boudouvis, E Gogolides
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (4 …, 2004
692004
Plasma processing for polymeric microfluidics fabrication and surface modification: Effect of super-hydrophobic walls on electroosmotic flow
N Vourdas, A Tserepi, AG Boudouvis, E Gogolides
Microelectronic Engineering 85 (5-6), 1124-1127, 2008
682008
Hierarchical, Plasma Nanotextured, Robust Superamphiphobic Polymeric Surfaces Structurally Stabilized Through a Wetting–drying Cycle
AK Gnanappa, DP Papageorgiou, E Gogolides, A Tserepi, ...
Plasma Processes and Polymers, 2011
602011
Flows of viscoplastic materials: models and computations
TC Papanastasiou, AG Boudouvis
Computers & structures 64 (1-4), 677-694, 1997
571997
Mass transport analysis in perforation-mediated modified atmosphere packaging of strawberries
G Xanthopoulos, ED Koronaki, AG Boudouvis
Journal of Food Engineering, 2012
532012
Modelling of radio frequency plasmas in tetrafluoromethane (CF4): the gas phase physics and the role of negative ion detachment
E Gogolides, M Stathakopoulos, A Boudouvis
Journal of Physics D: Applied Physics 27, 1878, 1994
511994
Multiscale modeling in chemical vapor deposition processes: Coupling reactor scale with feature scale computations
N Cheimarios, G Kokkoris, AG Boudouvis
Chemical engineering science 65 (17), 5018-5028, 2010
442010
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