Computer simulation of a carbon-deposition plasma in CH/sub 4 A Rhallabi, Y Catherine
IEEE transactions on plasma science 19 (2), 270-277, 1991
106 1991 Surface and plasma simulation of deposition processes: CH4 plasmas for the growth of diamondlike carbon NV Mantzaris, E Gogolides, AG Boudouvis, A Rhallabi, G Turban
Journal of applied physics 79 (7), 3718-3729, 1996
104 1996 RF plasmas in methane: Prediction of plasma properties and neutral radical densities with combined gas-phase physics and chemistry model E Gogolides, D Mary, A Rhallabi, G Turban
Japanese journal of applied physics 34 (1R), 261, 1995
104 1995 Monte Carlo simulation method for etching of deep trenches in Si by a G Marcos, A Rhallabi, P Ranson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (1 …, 2003
71 2003 Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma L Lallement, A Rhallabi, C Cardinaud, MC Peignon-Fernandez, LL Alves
Plasma Sources Science and Technology 18 (2), 025001, 2009
58 2009 Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation MA Blauw, E van der Drift, G Marcos, A Rhallabi
Journal of Applied Physics 94 (10), 6311-6318, 2003
56 2003 Radio-frequency glow discharges in methane gas: modelling of the gas-phase physics and chemistry E Gogolides, C Buteau, A Rhallabi, G Turban
Journal of Physics D: Applied Physics 27 (4), 818, 1994
51 1994 Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties A Pateau, A Rhallabi, MC Fernandez, M Boufnichel, F Roqueta
Journal of Vacuum Science & Technology A 32 (2), 2014
43 2014 Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication L Lallement, C Gosse, C Cardinaud, MC Peignon-Fernandez, A Rhallabi
Journal of Vacuum Science & Technology A 28 (2), 277-286, 2010
43 2010 Topographic and kinetic effects of the G Marcos, A Rhallabi, P Ranson
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
25 2004 Growth of nodular defects during film deposition L Dubost, A Rhallabi, J Perrin, J Schmitt
Journal of applied physics 78 (6), 3784-3791, 1995
25 1995 Modelling of fluorine based high density plasma for the etching of silica glasses L Lallement, A Rhallabi, C Cardinaud, MC Peignon Fernandez
Journal of Vacuum Science & Technology A 29 (5), 2011
22 2011 Global Model of R Chanson, A Rhallabi, MC Fernandez, C Cardinaud, S Bouchoule, ...
IEEE Transactions on Plasma Science 40 (4), 959-971, 2012
20 2012 SF6 and C4F8 global kinetic models coupled to sheath models Y Haidar, A Pateau, A Rhallabi, MC Fernandez, A Mokrani, F Taher, ...
Plasma Sources Science and Technology 23 (6), 065037, 2014
18 2014 Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition G Marcos, A Rhallabi, P Ranson
Applied surface science 254 (11), 3576-3584, 2008
15 2008 Estimation of surface kinetic parameters and two-dimensional simulation of InP pattern features during A Rhallabi, L Houlet, G Turban
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000
15 2000 Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching M Avella, J Jiménez, F Pommereau, JP Landesman, A Rhallabi
Applied Physics Letters 93 (13), 2008
14 2008 Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations A Rhallabi, M Gaillard, L Elmonser, G Marcos, A Talneau, F Pommereau, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
13 2005 Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process G Le Dain, A Rhallabi, MC Fernandez, M Boufnichel, F Roqueta
Journal of Vacuum Science & Technology A 35 (3), 2017
12 2017 Simulation of cryogenic silicon etching under SF6/O2/Ar plasma discharge Y Haidar, A Rhallabi, A Pateau, A Mokrani, F Taher, F Roqueta, ...
Journal of Vacuum Science & Technology A 34 (6), 2016
12 2016 