| Surface chemistry of copper metal and copper oxide atomic layer deposition from copper (ii) acetylacetonate: a combined first-principles and reactive molecular dynamics study X Hu, J Schuster, SE Schulz, T Gessner Physical Chemistry Chemical Physics 17 (40), 26892-26902, 2015 | 40 | 2015 |
| Density functional theory study of arsenic and selenium adsorption on the CaO (001) surface S Zhang, X Hu, Q Lu, J Zhang Energy & fuels 25 (7), 2932-2938, 2011 | 31 | 2011 |
| Ferrocenyl‐Pyrenes, Ferrocenyl‐9, 10‐Phenanthrenediones, and Ferrocenyl‐9, 10‐Dimethoxyphenanthrenes: Charge‐Transfer Studies and SWCNT Functionalization A Preuß, S Notz, E Kovalski, M Korb, T Blaudeck, X Hu, J Schuster, ... Chemistry–A European Journal 26 (12), 2635-2652, 2020 | 17 | 2020 |
| Multiparameter and Parallel Optimization of ReaxFF Reactive Force Field for Modeling the Atomic Layer Deposition of Copper X Hu, J Schuster, SE Schulz The Journal of Physical Chemistry C, 2017 | 13 | 2017 |
| Simulation of ALD chemistry of (nBu3P) 2Cu (acac) and Cu (acac) 2 precursors on Ta (110) surface X Hu, J Schuster, SE Schulz, T Gessner Microelectronic Engineering 137, 23-31, 2015 | 13 | 2015 |
| 吸附剂烟气脱砷的研究现状 张淑会， 吕庆， 胡晓 环境科学与技术 34 (3), 197-204, 2011 | 12 | 2011 |
| 含砷铁矿石脱砷过程的热力学 张淑会， 吕庆， 胡晓 中国有色金属学报 21 (7), 1705-1712, 2011 | 11 | 2011 |
| Mechanism of trace element adsorption on a clean and S precoated Pd (1 1 1) surface: Insight from density functional theory calculations X Hu, Q Lu, Y Sun, J Zhang Fuel 107, 290-298, 2013 | 10 | 2013 |
| 钒钛磁铁精矿分流制粒烧结中配碳量的影响 吕庆， 杨松陶， 孙艳芹， 胡晓， 白瑞国， 陈树军 钢铁 46 (11), 21-25, 2011 | 9 | 2011 |
| 含砷铁矿石烧结脱砷的试验研究 吕庆， 张淑会， 胡晓 钢铁, 7-11, 2010 | 8 | 2010 |
| Study on removal Arsenic from iron ore with Arsenic in sintering process Q Lu, SH Zhang, X Hu Advanced Materials Research 284, 238-241, 2011 | 6 | 2011 |
| 含砷铁矿石脱砷研究现状 胡晓， 吕庆， 张淑会 钢铁研究, 47-51, 2010 | 5 | 2010 |
| Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing M Huber, X Hu, A Zienert, J Schuster, SE Schulz The Journal of Chemical Physics 157 (8), 2022 | 3 | 2022 |
| Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study X Hu, J Schuster The Journal of Physical Chemistry C 126 (17), 7410-7420, 2022 | 2 | 2022 |
| Multiscale Simulation of Metallic Copper and Copper Oxide Atomic Layer Deposition from Cu Beta-diketonates X Hu Dissertation, Chemnitz, Technische Universität Chemnitz, 2017, 2018 | 1 | 2018 |
| Cover Feature: Ferrocenyl‐Pyrenes, Ferrocenyl‐9, 10‐Phenanthrenediones, and Ferrocenyl‐9, 10‐Dimethoxyphenanthrenes A Preuß, S Notz, E Kovalski, M Korb, T Blaudeck, X Hu, J Schuster, ... | | 2020 |
| Simulations for present and future nano electronics at Fraunhofer ENAS F Fuchs, X Hu, L Jäckel, E Lorenz, J Schuster, F Teichert, C Wagner, ... IHRS NANONET Annual Workshop 2015 93, 12, 2015 | | 2015 |
| Surface chemistry of copper metal and copper oxide atomic layer deposition from copper (II) acetylacetonate X Hu, J Schuster, SE Schulz, T Geßner | | 2015 |
| Simulation of ALD chemistry of copper metalorganic precursors on Ta (110) Surface X Hu, J Schuster, SE Schulz, T Geßner | | 2014 |
