Παρακολούθηση
Adra Carr
Adra Carr
Η διεύθυνση ηλεκτρονικού ταχυδρομείου έχει επαληθευτεί στον τομέα lanl.gov
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Παρατίθεται από
Παρατίθεται από
Έτος
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
N Loubet, T Hook, P Montanini, CW Yeung, S Kanakasabapathy, ...
2017 symposium on VLSI technology, T230-T231, 2017
7452017
Collapse of long-range charge order tracked by time-resolved photoemission at high momenta
T Rohwer, S Hellmann, M Wiesenmayer, C Sohrt, A Stange, B Slomski, ...
Nature 471 (7339), 490-493, 2011
5352011
Time-domain classification of charge-density-wave insulators
S Hellmann, T Rohwer, M Kalläne, K Hanff, C Sohrt, A Stange, A Carr, ...
Nature communications 3 (1), 1069, 2012
3642012
Tomographic reconstruction of circularly polarized high-harmonic fields: 3D attosecond metrology
C Chen, Z Tao, C Hernández-García, P Matyba, A Carr, R Knut, O Kfir, ...
Science Advances 2 (2), e1501333, 2016
1392016
Time-and angle-resolved photoemission spectroscopy with optimized high-harmonic pulses using frequency-doubled Ti: Sapphire lasers
S Eich, A Stange, AV Carr, J Urbancic, T Popmintchev, M Wiesenmayer, ...
Journal of Electron Spectroscopy and Related Phenomena 195, 231-236, 2014
1292014
Distinguishing attosecond electron–electron scattering and screening in transition metals
C Chen, Z Tao, A Carr, P Matyba, T Szilvási, S Emmerich, M Piecuch, ...
Proceedings of the National Academy of Sciences 114 (27), E5300-E5307, 2017
902017
Self-amplified photo-induced gap quenching in a correlated electron material
S Mathias, S Eich, J Urbancic, S Michael, AV Carr, S Emmerich, A Stange, ...
Nature communications 7 (1), 12902, 2016
732016
Tungsten and cobalt metallization: A material study for MOL local interconnects
V Kamineni, M Raymond, S Siddiqui, F Mont, S Tsai, C Niu, A Labonte, ...
2016 IEEE International Interconnect Technology Conference/Advanced …, 2016
572016
Laser damage growth in fused silica with simultaneous 351nm and 1053nm irradiation
MA Norton, AV Carr, CW Carr, EE Donohue, MD Feit, WG Hollingsworth, ...
Laser-Induced Damage in Optical Materials: 2008 7132, 454-461, 2008
522008
Parasitic resistance reduction strategies for advanced CMOS FinFETs beyond 7nm
H Wu, O Gluschenkov, G Tsutsui, C Niu, K Brew, C Durfee, C Prindle, ...
2018 IEEE International Electron Devices Meeting (IEDM), 35.4. 1-35.4. 4, 2018
392018
Contacts in advanced CMOS: History and emerging challenges
C Lavoie, P Adusumilli, AV Carr, JSJ Sweet, AS Ozcan, E Levrau, N Breil, ...
ECS Transactions 77 (5), 59, 2017
352017
Defect and grain boundary scattering in tungsten: A combined theoretical and experimental study
NA Lanzillo, H Dixit, E Milosevic, C Niu, AV Carr, P Oldiges, MV Raymond, ...
Journal of Applied Physics 123 (15), 2018
332018
Highly-selective superconformai CVD Ti silicide process enabling area-enhanced contacts for next-generation CMOS architectures
N Breil, A Carr, T Kuratomi, C Lavoie, IC Chen, M Stolfi, KD Chiu, W Wang, ...
2017 Symposium on VLSI Technology, T216-T217, 2017
222017
Controlling the electronic structure of graphene using surface-adsorbate interactions
P Matyba, A Carr, C Chen, DL Miller, G Peng, S Mathias, M Mavrikakis, ...
Physical Review B 92 (4), 041407, 2015
162015
Formation of wrap-around-contact to reduce contact resistivity
A Carr, J Zhang, CH Lee, T Ando, P Hashemi
US Patent 10,586,872, 2020
152020
External resistance reduction by nanosecond laser anneal in Si/SiGe CMOS technology
O Gluschenkov, H Wu, K Brew, C Niu, L Yu, Y Sulehria, S Choi, C Durfee, ...
2018 IEEE International Electron Devices Meeting (IEDM), 35.3. 1-35.3. 4, 2018
142018
First-principles investigations of TiGe/Ge interface and recipes to reduce the contact resistance
H Dixit, C Niu, M Raymond, V Kamineni, RK Pandey, A Konar, ...
IEEE Transactions on Electron Devices 64 (9), 3775-3780, 2017
132017
IEEE International Interconnect Technology Conference/Advanced Metallization Conference (IITC, AMC)
V Kamineni, M Raymond, S Siddiqui, F Mont, S Tsai, C Niu, A Labonte, ...
IEEE International Interconnect Technology Conference IITC, p. 105, 2016
122016
Integrated dual SPE processes with low contact resistivity for future CMOS technologies
H Wu, SC Seo, C Niu, W Wang, G Tsutsui, O Gluschenkov, Z Liu, ...
2017 IEEE International Electron Devices Meeting (IEDM), 22.3. 1-22.3. 4, 2017
102017
Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability
Z Liu, O Gluschenkov, H Niimi, B Liu, J Li, J Demarest, S Mochizuki, ...
2017 Symposium on VLSI Technology, T212-T213, 2017
102017
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